The SemiChem 4102 on-line process monitor offers engineers and operators the accuracy, reliability, and flexibility of real time process monitoring. The SemiChem 4102 can effectively increase yields, and contribute to zero defect programs by allowing for real time chemical concentration corrections before loss of product quality. Stable control of the process provides for product consistency. Application for the SemiChem 4102 are cleaning, etching, polishing, and plating processes.
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The SemiChem DSP is based upon the SemiChem 4102 chassis, but has been optimized for the DSP+ process for a totally aqueous photoresist stripping process. The SemiChem DSP monitors the low level fluoride concentration as well as the total acid concentration.
